Plasma resistance of Y 2O 3 nanofilms on quartz with different interlayer deposited by EB-PVD

Dae Min Kim, Sung Min Lee, In Ki Kim, Byung Koog Jang, Dae-Soon Lim, Yoon Suk Oh

Research output: Contribution to journalArticle

Abstract

The Y 2O 3 films were deposited on quartz plates using an electron beam (EB) evaporation method with different interlayer. The two types of interlayer, which were compositionally graded and alternated stacks of Y 2O 3 and SiO 2 layer, were applied with the intent to prevent flaking of the coating due to a thermal mismatch between the Y 2O 3 film and quartz substrate. The field emission scanning electron microscopy (FESEM) analysis indicated that the Y 2O 3 film with interlayer which consisting of alternated stacks of Y 2O 3 and SiO 2s layer, shows more structural stability, no crack propagation or flaking of the top layer, than other film samples. The plasma resistance of the Y 2O 3 films was analyzed by a plasma etching test using inductively coupled plasma (ICP) conditions with a gas mixture of CF 4/O 2. The etching resistance of the Y 2O 3 films was evaluated by measurement of etching depth. The etching depths of Y 2O 3 films with interlayer were shown as 20 times lower than quartz plate.

Original languageEnglish
Pages (from-to)539-543
Number of pages5
JournalNippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan
Volume120
Issue number1407
Publication statusPublished - 2012 Nov 1

Fingerprint

Quartz
Physical vapor deposition
Electron beams
interlayers
quartz
electron beams
Plasmas
flaking
Etching
etching
Plasma etching
structural stability
Inductively coupled plasma
crack propagation
plasma etching
Gas mixtures
Field emission
gas mixtures
field emission
Crack propagation

Keywords

  • EB PVD
  • ICP etching
  • Interlayer
  • Plasma resistance
  • Y O film

ASJC Scopus subject areas

  • Ceramics and Composites
  • Materials Chemistry
  • Chemistry(all)
  • Condensed Matter Physics

Cite this

Plasma resistance of Y 2O 3 nanofilms on quartz with different interlayer deposited by EB-PVD. / Kim, Dae Min; Lee, Sung Min; Kim, In Ki; Jang, Byung Koog; Lim, Dae-Soon; Oh, Yoon Suk.

In: Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan, Vol. 120, No. 1407, 01.11.2012, p. 539-543.

Research output: Contribution to journalArticle

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