Plasmonic color filters for large area display devices fabricated by laser interference lithography

Yun Seon Do, Jung Ho Park, Bo Yeon Hwang, Sung Min Lee, Byeong Kwon Ju, Kyung Cheol Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm x 2.5 cm.

Original languageEnglish
Title of host publication2012 Conference on Lasers and Electro-Optics, CLEO 2012
Publication statusPublished - 2012
Event2012 Conference on Lasers and Electro-Optics, CLEO 2012 - San Jose, CA, United States
Duration: 2012 May 62012 May 11

Publication series

Name2012 Conference on Lasers and Electro-Optics, CLEO 2012

Other

Other2012 Conference on Lasers and Electro-Optics, CLEO 2012
CountryUnited States
CitySan Jose, CA
Period12/5/612/5/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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    Do, Y. S., Park, J. H., Hwang, B. Y., Lee, S. M., Ju, B. K., & Choi, K. C. (2012). Plasmonic color filters for large area display devices fabricated by laser interference lithography. In 2012 Conference on Lasers and Electro-Optics, CLEO 2012 [6326631] (2012 Conference on Lasers and Electro-Optics, CLEO 2012).