Plasmonic color filters for large area display devices fabricated by laser interference lithography

Yun Seon Do, Jung Ho Park, Bo Yeon Hwang, Sung Min Lee, Byeong Kwon Ju, Kyung Cheol Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm x 2.5 cm.

Original languageEnglish
Title of host publicationCLEO
Subtitle of host publicationApplications and Technology, CLEO_AT 2012
PagesJW4A.119
Publication statusPublished - 2012
EventCLEO: Applications and Technology, CLEO_AT 2012 - San Jose, CA, United States
Duration: 2012 May 62012 May 11

Publication series

NameCLEO: Applications and Technology, CLEO_AT 2012

Other

OtherCLEO: Applications and Technology, CLEO_AT 2012
CountryUnited States
CitySan Jose, CA
Period12/5/612/5/11

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials

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    Do, Y. S., Park, J. H., Hwang, B. Y., Lee, S. M., Ju, B. K., & Choi, K. C. (2012). Plasmonic color filters for large area display devices fabricated by laser interference lithography. In CLEO: Applications and Technology, CLEO_AT 2012 (pp. JW4A.119). (CLEO: Applications and Technology, CLEO_AT 2012).