Plasmonic color filters for large area display devices fabricated by laser interference lithography

Yun Seon Do, Jung ho Park, Bo Yeon Hwang, Sung Min Lee, Byeong Kwon Ju, Kyung Cheol Choi

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrated a plasmonic color filter adopting laser interference lithography technology. Nano scaled hole arrays were obtained with a regular spatial period through the whole glass substrate area of 2.5 cm × 2.5 cm.

Original languageEnglish
Title of host publicationOptics InfoBase Conference Papers
Publication statusPublished - 2012 Dec 1
EventQuantum Electronics and Laser Science Conference, QELS 2012 - San Jose, CA, United States
Duration: 2012 May 62012 May 11

Other

OtherQuantum Electronics and Laser Science Conference, QELS 2012
CountryUnited States
CitySan Jose, CA
Period12/5/612/5/11

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ASJC Scopus subject areas

  • Instrumentation
  • Atomic and Molecular Physics, and Optics

Cite this

Do, Y. S., Park, J. H., Hwang, B. Y., Lee, S. M., Ju, B. K., & Choi, K. C. (2012). Plasmonic color filters for large area display devices fabricated by laser interference lithography. In Optics InfoBase Conference Papers