Printed silicon broadband membrane reflectors by laser interference lithography

Hyeon Jun Ha, Jungho Park, Bo Yeon Hwang, Sangbin Lee, Byeong Kwon Ju

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We report on printed silicon photonic crystal broadband membrane reflectors (MRs) based on laser interference lithography (LIL) patterning. Single-layer photonic crystal membrane which was formed by the LIL technique on a silicon-on-insulator (SOI) wafer was transferred by the contact printing method using the polydimethylsiloxane (PDMS) stamp on a glass substrate. These broadband silicon-MRs show high-reflectivity of 95 % around 1200 nm wavelength with bandwidth of about 100 nm. This simplest and easiest method to fabricate broadband MRs has great potential for many types of optoelectronic and photonic devices.

Original languageEnglish
Title of host publicationCAS 2013 Proceedings - 2013 International Semiconductor Conference
Pages123-126
Number of pages4
DOIs
Publication statusPublished - 2013 Dec 1
Event36th International Semiconductor Conference, CAS 2013 - Sinaia, Romania
Duration: 2013 Oct 142013 Oct 16

Publication series

NameProceedings of the International Semiconductor Conference, CAS
Volume1

Conference

Conference36th International Semiconductor Conference, CAS 2013
CountryRomania
CitySinaia
Period13/10/1413/10/16

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ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Ha, H. J., Park, J., Hwang, B. Y., Lee, S., & Ju, B. K. (2013). Printed silicon broadband membrane reflectors by laser interference lithography. In CAS 2013 Proceedings - 2013 International Semiconductor Conference (pp. 123-126). [6688107] (Proceedings of the International Semiconductor Conference, CAS; Vol. 1). https://doi.org/10.1109/SMICND.2013.6688107