Properties of hydorogenated Al-doped ZnO films by multi-step texture

Sung Ju Tark; Min Gu Kang; Sungeun Park; Yong Hyun Kim; Won Mok Kim; Donghwan Kim

doi:10.3740/MRSK.2009.19.5.259

Properties of hydorogenated Al-doped ZnO films by multi-step texture

Sung Ju Tark, Min Gu Kang, Sungeun Park, Yong Hyun Kim, Won Mok Kim, Donghwan Kim

Department of Materials Science and Engineering

Research output: Contribution to journal › Article › peer-review

1 Citation (Scopus)

Abstract

In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H₂/(Ar+H₂) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

Original language	English
Pages (from-to)	259-264
Number of pages	6
Journal	Korean Journal of Materials Research
Volume	19
Issue number	5
DOIs	https://doi.org/10.3740/MRSK.2009.19.5.259
Publication status	Published - 2009

Keywords

Hydrogenated
Rf magnetron sputter
Surface textured
TCO
ZnO : Al

ASJC Scopus subject areas

Materials Science(all)

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10.3740/MRSK.2009.19.5.259

Cite this

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title = "Properties of hydorogenated Al-doped ZnO films by multi-step texture",

abstract = "In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.",

keywords = "Hydrogenated, Rf magnetron sputter, Surface textured, TCO, ZnO : Al",

author = "Tark, {Sung Ju} and Kang, {Min Gu} and Sungeun Park and Kim, {Yong Hyun} and Kim, {Won Mok} and Donghwan Kim",

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issn = "1225-0562",

publisher = "The Korea Federation of Science and Technology",

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T1 - Properties of hydorogenated Al-doped ZnO films by multi-step texture

AU - Tark, Sung Ju

AU - Kang, Min Gu

AU - Park, Sungeun

AU - Kim, Yong Hyun

AU - Kim, Won Mok

AU - Kim, Donghwan

PY - 2009

Y1 - 2009

N2 - In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

AB - In this study we investigated the effect of the multi-step texturing process on the electrical and optical properties of hydrogenated Al-doped zinc oxide (HAZO) thin films deposited by rf magnetron sputtering. AZO films on glass were prepared by changing the H2/(Ar+H2) ratio at a low temperature of 150 °C. The prepared HAZO films showed lower resistivity and higher carrier concentration and mobility than those of non-hydrogenated AZO films. After deposition, the surface of the HAZO films was multi-step textured in diluted HCl (0.5%) for the investigation of the change in the optical properties and the surface morphology due to etching. As a result, the HAZO film fabricated under the type III condition showed excellent optical properties with a haze value of 52.3%.

KW - Hydrogenated

KW - Rf magnetron sputter

KW - Surface textured

KW - TCO

KW - ZnO : Al

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DO - 10.3740/MRSK.2009.19.5.259

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SN - 1225-0562

VL - 19

SP - 259

EP - 264

JO - Korean Journal of Materials Research

JF - Korean Journal of Materials Research

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ER -

Properties of hydorogenated Al-doped ZnO films by multi-step texture

Abstract

Keywords

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