Quasi-Two-Dimensional h-BN/β-Ga2O3 Heterostructure Metal-Insulator-Semiconductor Field-Effect Transistor

Janghyuk Kim, Michael A. Mastro, Marko J. Tadjer, Jihyun Kim

Research output: Contribution to journalArticlepeer-review

83 Citations (Scopus)


β-gallium oxide (β-Ga2O3) and hexagonal boron nitride (h-BN) heterostructure-based quasi-two-dimensional metal-insulator-semiconductor field-effect transistors (MISFETs) were demonstrated by integrating mechanical exfoliation of (quasi)-two-dimensional materials with a dry transfer process, wherein nanothin flakes of β-Ga2O3 and h-BN were utilized as the channel and gate dielectric, respectively, of the MISFET. The h-BN dielectric, which has an extraordinarily flat and clean surface, provides a minimal density of charged impurities on the interface between β-Ga2O3 and h-BN, resulting in superior device performances (maximum transconductance, on/off ratio, subthreshold swing, and threshold voltage) compared to those of the conventional back-gated configurations. Also, double-gating of the fabricated device was demonstrated by biasing both top and bottom gates, achieving the modulation of the threshold voltage. This heterostructured wide-band-gap nanodevice shows a new route toward stable and high-power nanoelectronic devices.

Original languageEnglish
Pages (from-to)21322-21327
Number of pages6
JournalACS Applied Materials and Interfaces
Issue number25
Publication statusPublished - 2017 Jun 28


  • field-effect transistor
  • gallium oxide
  • heterostructure
  • two-dimensional material
  • wide-band-gap semiconductor

ASJC Scopus subject areas

  • Materials Science(all)


Dive into the research topics of 'Quasi-Two-Dimensional h-BN/β-Ga2O3 Heterostructure Metal-Insulator-Semiconductor Field-Effect Transistor'. Together they form a unique fingerprint.

Cite this