Random Si nanopillar fabrication by spontaneous dewetting of indium for broadband antireflection

Junhee Choi, Doo Seok Jeong, Wook Seong Lee, Taek Sung Lee, Kyeong Seok Lee, Won Mok Kim, Donghwan Kim, Inho Kim

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

We introduce and demonstrate a cost-effective method for the fabrication of random short Si nanopillars using metal-assisted chemical etching for effective light trapping in crystalline Si wafers. Random crystalline Si nanopillars were fabricated by metal-assisted etching of the crystalline Si wafers using Au nanohole thin films as a metal catalyst. The Au nanohole thin films were prepared by thermal evaporation of Au onto crystalline Si wafers with indium nanoparticles serving as shadow masks. Indium nanoparticles were synthesized by thermal evaporation and spontaneous dewetting at room temperature. The Si nanopillars height could be adjusted by varying the etching time. The improved broadband antireflectance provided by the fabricated crystalline Si nanopillars was confirmed by measurements of the total light absorption of the Si wafers.

Original languageEnglish
Pages (from-to)10644-10648
Number of pages5
JournalJournal of Nanoscience and Nanotechnology
Volume16
Issue number10
DOIs
Publication statusPublished - 2016 Oct 1

Keywords

  • Broadband antireflection
  • Mie scattering
  • Si nanopillar
  • Solar cells

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Biomedical Engineering
  • Materials Science(all)
  • Condensed Matter Physics

Fingerprint Dive into the research topics of 'Random Si nanopillar fabrication by spontaneous dewetting of indium for broadband antireflection'. Together they form a unique fingerprint.

  • Cite this