Rational and Facile Construction of 3D Annular Nanostructures with Tunable Layers by Exploiting the Diffraction and Interference of Light

Jong Ho Choe, Q Han Park, Eun Ah You

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

This paper reports a rational and facile approach to fabricating arrays of 3D annular nanostructures with tunable layers by utilizing the diffraction and interference of UV light. Based on discretized Fresnel bright spots and standing waves formed within a photoresist film, the structures with nanoscale features are realized using simple, conventional photolithography. The 3D annular nanostructures are produced in arrays of single-, double-, and triple-layered ring structures with the height of single layer on a 100 nm scale. The structural formation process and features of the nanostructures are analyzed and explained through 3D modeling that integrates the effects of both UV exposure dose and chemical kinetics. The approach to generating 3D annular nanostructures with tunable layers and discrete heights can be adapted for various applications that require the 3D structures fabricated over a large area with high throughput.

Original languageEnglish
JournalAdvanced Functional Materials
DOIs
Publication statusAccepted/In press - 2016

Fingerprint

Wave interference
Nanostructures
Diffraction
interference
diffraction
ring structures
photolithography
standing waves
photoresists
reaction kinetics
Photolithography
Photoresists
Reaction kinetics
Ultraviolet radiation
dosage
Throughput
kinetics

Keywords

  • 3D annular nanostructure
  • Diffraction
  • Interference
  • Modeling
  • Photolithography

ASJC Scopus subject areas

  • Biomaterials
  • Electrochemistry
  • Condensed Matter Physics
  • Electronic, Optical and Magnetic Materials

Cite this

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AB - This paper reports a rational and facile approach to fabricating arrays of 3D annular nanostructures with tunable layers by utilizing the diffraction and interference of UV light. Based on discretized Fresnel bright spots and standing waves formed within a photoresist film, the structures with nanoscale features are realized using simple, conventional photolithography. The 3D annular nanostructures are produced in arrays of single-, double-, and triple-layered ring structures with the height of single layer on a 100 nm scale. The structural formation process and features of the nanostructures are analyzed and explained through 3D modeling that integrates the effects of both UV exposure dose and chemical kinetics. The approach to generating 3D annular nanostructures with tunable layers and discrete heights can be adapted for various applications that require the 3D structures fabricated over a large area with high throughput.

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