Reactive ion etching of GaN using CHF3/Ar and C 2ClF5/Ar plasmas

Heon Lee, David B. Oberman, James S. Harris

Research output: Contribution to journalArticlepeer-review

94 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Reactive ion etching of GaN using CHF<sub>3</sub>/Ar and C <sub>2</sub>ClF<sub>5</sub>/Ar plasmas'. Together they form a unique fingerprint.

Physics & Astronomy