Abstract
We describe a simple concept of an in situ photolithographic technique by using a liquid crystal display panel as a configurable mask and a CCD (charge coupled device) camera as a simple imaging system. The successive operation of imaging and configurable masking enabled a real-time projection lithography process by the selective exposure of light through the LCD (liquid crystal display) panel. A correction of a defect pattern could be also demonstrated by optimizing the exposure conditions and aligning the mismatches between imaging and the corresponding lithographic patterning.
| Original language | English |
|---|---|
| Pages (from-to) | 1040-1046 |
| Number of pages | 7 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 5377 |
| Issue number | PART 2 |
| DOIs | |
| Publication status | Published - 2004 |
| Event | Optical Microlithography XVII - Santa Clara, CA, United States Duration: 2004 Jan 24 → 2004 Jan 27 |
Keywords
- Configurable mask
- Exposure system
- Imaging system
- In situ photolithography
- LCD (liquid crystal display) panel
- Microlithography
- Real-time lithography
- Selective exposure
- Stereo-typed microscope
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Computer Science Applications
- Applied Mathematics
- Electrical and Electronic Engineering