Real-time microlithography employing a transparent liquid crystal display (LCD) panel as a configurable mask

Sung Hoon Pieh, Byoung Ho Park, Yu Jin Jang, Kang Hyun Kim, Gyu Tae Kim

Research output: Contribution to journalConference article

Abstract

We describe a simple concept of an in situ photolithographic technique by using a liquid crystal display panel as a configurable mask and a CCD (charge coupled device) camera as a simple imaging system. The successive operation of imaging and configurable masking enabled a real-time projection lithography process by the selective exposure of light through the LCD (liquid crystal display) panel. A correction of a defect pattern could be also demonstrated by optimizing the exposure conditions and aligning the mismatches between imaging and the corresponding lithographic patterning.

Original languageEnglish
Pages (from-to)1040-1046
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5377
Issue numberPART 2
DOIs
Publication statusPublished - 2004 Aug 18
EventOptical Microlithography XVII - Santa Clara, CA, United States
Duration: 2004 Jan 242004 Jan 27

Keywords

  • Configurable mask
  • Exposure system
  • Imaging system
  • In situ photolithography
  • LCD (liquid crystal display) panel
  • Microlithography
  • Real-time lithography
  • Selective exposure
  • Stereo-typed microscope

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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