Reconfiguration of operation modes in silicon nanowire field-effect transistors by electrostatic virtual doping

Taekham Kim, Doohyeok Lim, Jaemin Son, Kyoungah Cho, Sangsig Kim

Research output: Contribution to journalArticlepeer-review

Abstract

In this study, we perform reconfigurable n- and p-channel operations of a tri-top-gate field-effect transistor (FET) made of a p+-i-n+ silicon nanowire (SiNW). In the reconfigurable FET (RFET), two polarity gates and one control gate induce virtual electrostatic doping in the SiNW channel. The polarity gates are electrically connected to each other and program the channel type, while the control gate modulates the flow of charge carriers in the SiNW channel. The SiNW RFET features simple device design, symmetrical electrical characteristics in the n- and p-channel operation modes using p+-i-n+ diode characteristics, and both operation modes exhibit high ON/OFF ratios (∼106) and high ON currents (∼1 μA μm-1). The proposed device is demonstrated experimentally using a fully CMOS-compatible top-down processes.

Original languageEnglish
Article number415203
JournalNanotechnology
Volume33
Issue number41
DOIs
Publication statusPublished - 2022 Oct 8

Keywords

  • electrostatic doping
  • polarity control
  • reconfigurable field-effect transistors
  • silicon nanowires

ASJC Scopus subject areas

  • Bioengineering
  • Chemistry(all)
  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering
  • Electrical and Electronic Engineering

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