TY - GEN
T1 - Reduction of critical current density for spin transfer magnetization switching in a spin-valve nano-pillar
AU - Kang, C. H.
AU - Lee, J. C.
AU - Shin, K. H.
AU - Lim, S. H.
PY - 2006
Y1 - 2006
N2 - Experimental results on the current induced magnetization switching of nano-patterned IrMn/CoFe/Cu/CoFe spin-valves are reported. The main emphasis is the increase of MR and the reduction of the critical current density through an improved fabrication process. A method using a batch-fabricated trilayer template is developed with the junction features defined by a platinum(Pt) stencil mask. Nano-pillars with the lateral dimensions (150×80 nm 2) are fabricated by electron-beam lithography, including a wet etching to form a nanotemplate. A key to the improved fabrication process is the formation of the recessed part of the SiO2 layer which helps to reduce the shadow effect during the deposition of the spin valve multilayers into the nanotemplate. Both the MR ratio and the critical current density are enhanced by the new improved fabrication process. The observed critical current density is 5.98 ×106 A/cm2, which is significantly smaller than the value of 1.16×108 A/cm2 observed in a similar device fabricated using a conventional fabrication process.
AB - Experimental results on the current induced magnetization switching of nano-patterned IrMn/CoFe/Cu/CoFe spin-valves are reported. The main emphasis is the increase of MR and the reduction of the critical current density through an improved fabrication process. A method using a batch-fabricated trilayer template is developed with the junction features defined by a platinum(Pt) stencil mask. Nano-pillars with the lateral dimensions (150×80 nm 2) are fabricated by electron-beam lithography, including a wet etching to form a nanotemplate. A key to the improved fabrication process is the formation of the recessed part of the SiO2 layer which helps to reduce the shadow effect during the deposition of the spin valve multilayers into the nanotemplate. Both the MR ratio and the critical current density are enhanced by the new improved fabrication process. The observed critical current density is 5.98 ×106 A/cm2, which is significantly smaller than the value of 1.16×108 A/cm2 observed in a similar device fabricated using a conventional fabrication process.
KW - Current-induced magnetization switching
KW - Improved fabrication process
KW - Spin transfr torque
KW - Spin-valve nano-pillar
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U2 - 10.1109/NMDC.2006.4388929
DO - 10.1109/NMDC.2006.4388929
M3 - Conference contribution
AN - SCOPUS:50249170289
SN - 1424405408
SN - 9781424405404
T3 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
SP - 614
EP - 615
BT - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
T2 - 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Y2 - 22 October 2006 through 25 October 2006
ER -