Removal of sulfur compounds in FCC raw C4 using activated carbon impregnated with CuCl and PdCl2

Kyu sung Kim, Sun Hee Park, Ki Tae Park, Byung Hee Chun, Sung Hyun Kim

Research output: Contribution to journalArticlepeer-review

27 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds