Replication of high ordered nano-sphere array by nanoimprint lithography

Sung Hoon Hong, Byeong Ju Bae, Jae Yeon Hwang, Seon Yong Hwang, Heon Lee

Research output: Contribution to journalArticle

7 Citations (Scopus)

Abstract

High ordered nano-sphere array patterns on Si substrate were fabricated using nanoimprint lithography. First, using hot embossing method, poly vinyl chloride (PVC) based polymer replica template was duplicated from original high ordered nano-sphere array patterns, which was fabricated by evaporation method. The monolayer transferring condition can be achieved by varying hot embossing pressure. Then, through UV nanoimprint lithography with the replicated polymer template, imprinted patterns, which has high ordered nano-sphere array patterns, was successfully fabricated on Si and flexible PET substrate.

Original languageEnglish
Pages (from-to)2423-2426
Number of pages4
JournalMicroelectronic Engineering
Volume86
Issue number12
DOIs
Publication statusPublished - 2009 Dec 1

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Keywords

  • DLC coating
  • Flexible polymer template
  • Hot embossing
  • UV nanoimprint lithography

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics

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