Retention enhancement through capacitance-dependent voltage division analysis in 3D stackable TaOx/HfO2-based selectorless memristor

Ji Hoon Sung, Ju Hyun Park, Dong Su Jeon, Donghyun Kim, Min Ji Yu, Atul C. Khot, Tukaram D. Dongale, Tae Geun Kim

Research output: Contribution to journalArticlepeer-review

2 Citations (Scopus)

Abstract

Sneak path current generated by adjacent cells in three-dimensional (3D) memristor arrays must be curbed while securing the multi-bit storage capability of each cell to aid in the cost-effective increase in array size. For this purpose, a 3D stackable TaOx/HfO2-based selectorless memristor has been proposed and optimized via capacitance-dependent voltage division analysis. The proposed device utilizes the formation or rupture of conductive filaments for self-rectifying resistive switching operation, in contrast to nonfilamentary devices that often exploit the change in the charge state of the electron trap. This approach enables the reduction of the trapped charge leakage through the interface between the resistive switching and metal layers effectively, giving rise to excellent retention properties (>5 × 105 s). Furthermore, the proposed device exhibits a sufficiently high on/off ratio (~1.35 × 103), rectification ratio (~2.3 × 103), endurance (1.5 × 102 cycles), and low resistance variation (standard deviation <0.022). Moreover, multilevel operations are facilitated, making the proposed device suitable for high-density, nonvolatile memory applications.

Original languageEnglish
Article number109845
JournalMaterials and Design
Volume207
DOIs
Publication statusPublished - 2021 Sep

Keywords

  • Bilayer memristor
  • Crossbar array
  • Multilevel memory
  • Nonvolatile memory
  • Self-rectifying

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

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