Role of a Mo interlayer on the thermal stability of nickel silicides

Y. W. Ok, C. J. Choi, Tae Yeon Seong, C. Thanachayanont

Research output: Contribution to journalArticle

Abstract

We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi 2 at temperatures in excess of 700°C, at which the tetragonal MoSi 2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

Original languageEnglish
Pages (from-to)475-478
Number of pages4
JournalDesign and Nature
Volume6
Publication statusPublished - 2004 Nov 17
Externally publishedYes

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Silicides
Thermodynamic stability
Nickel
Surface morphology
Diffraction
X rays
Temperature

ASJC Scopus subject areas

  • Engineering(all)

Cite this

Ok, Y. W., Choi, C. J., Seong, T. Y., & Thanachayanont, C. (2004). Role of a Mo interlayer on the thermal stability of nickel silicides. Design and Nature, 6, 475-478.

Role of a Mo interlayer on the thermal stability of nickel silicides. / Ok, Y. W.; Choi, C. J.; Seong, Tae Yeon; Thanachayanont, C.

In: Design and Nature, Vol. 6, 17.11.2004, p. 475-478.

Research output: Contribution to journalArticle

Ok, YW, Choi, CJ, Seong, TY & Thanachayanont, C 2004, 'Role of a Mo interlayer on the thermal stability of nickel silicides', Design and Nature, vol. 6, pp. 475-478.
Ok, Y. W. ; Choi, C. J. ; Seong, Tae Yeon ; Thanachayanont, C. / Role of a Mo interlayer on the thermal stability of nickel silicides. In: Design and Nature. 2004 ; Vol. 6. pp. 475-478.
@article{0a0bc824016843b38fa5dcc305e76725,
title = "Role of a Mo interlayer on the thermal stability of nickel silicides",
abstract = "We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi 2 at temperatures in excess of 700°C, at which the tetragonal MoSi 2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.",
author = "Ok, {Y. W.} and Choi, {C. J.} and Seong, {Tae Yeon} and C. Thanachayanont",
year = "2004",
month = "11",
day = "17",
language = "English",
volume = "6",
pages = "475--478",
journal = "Design and Nature",
issn = "1478-0585",
publisher = "WIT Press",

}

TY - JOUR

T1 - Role of a Mo interlayer on the thermal stability of nickel silicides

AU - Ok, Y. W.

AU - Choi, C. J.

AU - Seong, Tae Yeon

AU - Thanachayanont, C.

PY - 2004/11/17

Y1 - 2004/11/17

N2 - We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi 2 at temperatures in excess of 700°C, at which the tetragonal MoSi 2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

AB - We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi 2 at temperatures in excess of 700°C, at which the tetragonal MoSi 2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

UR - http://www.scopus.com/inward/record.url?scp=7744222910&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=7744222910&partnerID=8YFLogxK

M3 - Article

VL - 6

SP - 475

EP - 478

JO - Design and Nature

JF - Design and Nature

SN - 1478-0585

ER -