Role of a Mo interlayer on the thermal stability of nickel silicides

Y. W. Ok, C. J. Choi, T. Y. Seong, C. Thanachayanont

Research output: Contribution to journalConference article

Abstract

We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which the tetragonal MoSi2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.

Original languageEnglish
Pages (from-to)475-478
Number of pages4
JournalDesign and Nature
Volume6
Publication statusPublished - 2004
EventDesign and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece
Duration: 2004 Jun 282004 Jun 30

ASJC Scopus subject areas

  • Engineering(all)

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  • Cite this

    Ok, Y. W., Choi, C. J., Seong, T. Y., & Thanachayanont, C. (2004). Role of a Mo interlayer on the thermal stability of nickel silicides. Design and Nature, 6, 475-478.