We investigate the effect of a Mo interlayer on the thermal stability of nickel suicides. Glancing angle x-ray diffraction results show that NiSi is transformed into NiSi2 at temperatures in excess of 700°C, at which the tetragonal MoSi2 phase is also formed. It is shown that the Mo layer moves toward the surface region, when annealed at temperatures in excess of 500°C. It is also shown that the use of the interlayer is effective in improving the surface morphology of the suicide films and the uniformity of the silicide/Si interface.
|Number of pages||4|
|Journal||Design and Nature|
|Publication status||Published - 2004|
|Event||Design and Nature II: Comparing Design in Nature with Science and Engineering - Rhodes, Greece|
Duration: 2004 Jun 28 → 2004 Jun 30
ASJC Scopus subject areas