Screen-printed multicrystalline silicon solar cells with porous silicon antireflective layer formed by electrochemical etching

Jae Hong Kwon, Soo Hong Lee, Byeong Kwon Ju

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

The latest results on the use of porous silicon (PS) as an antireflection coating (ARC) in simplified processing for multicrystalline silicon (mc-Si) solar cells are presented. A PS layer with optimal antireflection characteristics was obtained for charge density (Q) of 5.2 C cm2. The weighted reflectance was reduced to 4.7% in the range of wavelengths between 400 and 1000 nm. Also, the optimization of a PS selective emitter formation results in a 13.2% efficiency mc-Si cell (2×2 cm2) with the electroplating method. Specific attention is given to the implementation of a PS ARC into a commercially compatible screen-printed solar cell process.

Original languageEnglish
Article number104515
JournalJournal of Applied Physics
Volume101
Issue number10
DOIs
Publication statusPublished - 2007 Jun 11

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porous silicon
solar cells
etching
antireflection coatings
electroplating
emitters
reflectance
optimization
silicon
cells
wavelengths

ASJC Scopus subject areas

  • Physics and Astronomy (miscellaneous)
  • Physics and Astronomy(all)

Cite this

Screen-printed multicrystalline silicon solar cells with porous silicon antireflective layer formed by electrochemical etching. / Kwon, Jae Hong; Lee, Soo Hong; Ju, Byeong Kwon.

In: Journal of Applied Physics, Vol. 101, No. 10, 104515, 11.06.2007.

Research output: Contribution to journalArticle

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