Secondary electron generation in electron-beam-irradiated solids: Resolution limits to nanolithography

Kyu Won Lee, S. M. Yoon, S. C. Lee, W. Lee, I. M. Kim, Cheol Eui Lee, D. H. Kim

Research output: Contribution to journalArticle

13 Citations (Scopus)

Abstract

We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.

Original languageEnglish
Pages (from-to)1720-1723
Number of pages4
JournalJournal of the Korean Physical Society
Volume55
Issue number4
DOIs
Publication statusPublished - 2009 Oct 1

Keywords

  • Electron-beam nanolithography
  • Monte Carlo simulation
  • Secondary electron generation

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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