We have investigated the secondary electron generation in electron-beam-irradiated solids by means of a Monte Carlo simulation. The slow secondary electron energy was found to be independent of the position and the incident energy of the electron beam, and the electron beam broadening in thin films due to secondary electrons was found to be at least 5-10 nm, setting limits to the nanolithographic resolution.
- Electron-beam nanolithography
- Monte Carlo simulation
- Secondary electron generation
ASJC Scopus subject areas
- Physics and Astronomy(all)