Selective deposition of the silver nano-particles using patterned the hydrophobic self-assembled monolayer patterns and zero-residual nano-imprint lithography

Ki Yeon Yang, Jong Woo Kim, Kyeong Jae Byeon, Heon Lee

Research output: Contribution to journalArticle

16 Citations (Scopus)

Abstract

In order to utilize Ag nano-particles into micro-nano-devices, they need to be selectively deposited as a sub-micrometer scale to form the patterns. Self-assembled monolayer (SAM) can modify the surface properties of substrate according to its terminal functional groups. Especially, the hydrophobic SAM can drastically reduce the surface energy of substrate and it may be applied to the various selective deposition applications. In this study, the trichlorosilane based hydrophobic SAM was patterned by the zero-residual layer nano-imprint lithography and Ag nano-particles were selectively deposited to form a sub-micrometer sized patterns.

Original languageEnglish
Pages (from-to)1552-1555
Number of pages4
JournalMicroelectronic Engineering
Volume84
Issue number5-8
DOIs
Publication statusPublished - 2007 May

Keywords

  • Nano-imprint lithography
  • SAM pattern
  • Selective deposition
  • Silver nano-particle

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Atomic and Molecular Physics, and Optics
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Electrical and Electronic Engineering

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