Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition

Juno Shim, Ho Gyu Yoon, Sang Hyun Na, Insun Kim, Soonjong Kwak

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

Thin silicon oxynitride (SiOxNy) has been deposited for a gas barrier layer on the surface of poly(ether sulfone) film using plasma-enhanced chemical vapor deposition (PECVD) of a mixture of hexamethyldisiloxane (HMDSO) and ammonia. The chemical structure of the deposited layer varied from organic to inorganic structures depending on RF plasma input power applied to the reaction system. A silicon-based undercoat layer, which has an organic/inorganic hybrid structure, was used as an interfacial buffer layer between the organic PES and inorganic SiOxNy layer. With the help of the undercoat layer, the dense inorganic SiOxNy layer gave a superior oxygen barrier property of 0.2 cm3/m2 day at a critical coating thickness of ca. 20 nm. In a highly stressed SiOxNy film, the effect of the undercoat layer was remarkable in preventing crack formation during bending tests.

Original languageEnglish
Pages (from-to)2844-2849
Number of pages6
JournalSurface and Coatings Technology
Volume202
Issue number13
DOIs
Publication statusPublished - 2008 Mar 25

Fingerprint

Sulfones
sulfones
oxynitrides
Silicon
Plasma enhanced chemical vapor deposition
Ether
Ethers
ethers
Gases
vapor deposition
coatings
Coatings
Bending tests
silicon
Buffer layers
Ammonia
gases
Crack initiation
Oxygen
Plasmas

Keywords

  • Flexible display
  • Gas barrier
  • Plastic substrate
  • Poly(ether sulfone)
  • Silicon oxynitride
  • Undercoat

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition. / Shim, Juno; Yoon, Ho Gyu; Na, Sang Hyun; Kim, Insun; Kwak, Soonjong.

In: Surface and Coatings Technology, Vol. 202, No. 13, 25.03.2008, p. 2844-2849.

Research output: Contribution to journalArticle

Shim, Juno ; Yoon, Ho Gyu ; Na, Sang Hyun ; Kim, Insun ; Kwak, Soonjong. / Silicon oxynitride gas barrier coatings on poly(ether sulfone) by plasma-enhanced chemical vapor deposition. In: Surface and Coatings Technology. 2008 ; Vol. 202, No. 13. pp. 2844-2849.
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