Simple micro-scale selective patterning on a single nanowire by using an optical microscope

Dong Jin Oh, Boone Won, Kang Hyun Kim, Gyu Tae Kim

Research output: Contribution to journalConference article

Abstract

A simple convenient way of forming a selective patterning on a single nanowire was demonstrated by using a conventional optical microscope. The fine resolution could reach approximately 5 μ m, which is enough to define electrode patterns on a single nanowire in a two-probe configuration. The photolithographic processes were carried out under the microscope with photoresist-coated substrate deposited by nanowires. Through the image capture and a proper configuration of the various home-made photomasks could produce a selective patterning on an individual nanowire successfully. Current-voltage characteristics of an individual GaN single nanowire were measured as a demonstration.

Original languageEnglish
Article number166
Pages (from-to)1500-1507
Number of pages8
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume5754
Issue numberPART 3
DOIs
Publication statusPublished - 2005
EventOptical Microlithography XVIII - San Jose, CA, United States
Duration: 2005 Mar 12005 Mar 4

Keywords

  • Nanowire
  • Optical microscope
  • Photo lithography
  • Selective patterning

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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