Simple selective electron beam patterning on a single nanowire

Kanghyun Kim, Haeyong Kang, Jung Hwan Huh, Gyu Tae Kim

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Newly developed techniques of selective electron beam patterning on a single nanowire are introduced without using the coordinate markers on the substrate or with the help of the optical microscopes. Coordinate-less patterning by image processing under scanning electron microscope was efficient to define electrodes patterns on the 100 nm scale nanowires. And a method using an optical microscope image made it possible not only to create fine electrodes of 10 nm order of nanowires but to reduce the working times and enable the process easier. A proper selective patterning of the electrode on a selected individual nanowire will be quite helpful for the fundamental researches as the bottom-up approach on the different length scale of nanowires.

Original languageEnglish
Title of host publication2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Pages408-409
Number of pages2
DOIs
Publication statusPublished - 2006
Event2006 IEEE Nanotechnology Materials and Devices Conference, NMDC - Gyeongju, Korea, Republic of
Duration: 2006 Oct 222006 Oct 25

Publication series

Name2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
Volume1

Other

Other2006 IEEE Nanotechnology Materials and Devices Conference, NMDC
CountryKorea, Republic of
CityGyeongju
Period06/10/2206/10/25

Keywords

  • Electron beam lithography
  • Nanodevice
  • Nanowire

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Materials Science(all)

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    Kim, K., Kang, H., Huh, J. H., & Kim, G. T. (2006). Simple selective electron beam patterning on a single nanowire. In 2006 IEEE Nanotechnology Materials and Devices Conference, NMDC (pp. 408-409). [4388790] (2006 IEEE Nanotechnology Materials and Devices Conference, NMDC; Vol. 1). https://doi.org/10.1109/NMDC.2006.4388790