Smart self-adjustment of surface micelles of an amphiphilic block copolymer to nanoscopic pattern boundaries

Bokyung Yoon, June Huh, Hiroshi Ito, Jane Frommer, Byeong Hyeok Sohn, Jung Hyun Kim, Edwin L. Thomas, Cheolmin Park, Ho Cheol Kim

Research output: Contribution to journalArticle

15 Citations (Scopus)

Abstract

A study was conducted to control the structural symmetry and periodicity of a self-assembled block copolymer in a nanopattern template. Block copolymers show nano-sized structures and have the ability to undergo morphological reformation under various external fields. A method was analyzed, which was based on confining surface pinned micelles consisting of poly(styrene-block-4- hydroxystyrene) (PS-b-PHOST) onto topographically patterned silicon oxide substrates. The PHOST blocks have strong affinity to the substrate through the hydrogen bonding between hydroxyl groups of PHOST and the oxide surface. Atomic force microscopy (AFM) was employed to determine the surface morphology and height variation of copolymers. A dynamic Monte Carlo (MC) method was used to simulate the system of polymer chains grafted to a solid surface. Results show that topographic pre-pattern allows precise control of spatial arrangement of pinned micelles that enables the fabrication of periodic nano-arrays.

Original languageEnglish
Pages (from-to)3342-3348
Number of pages7
JournalAdvanced Materials
Volume19
Issue number20
DOIs
Publication statusPublished - 2007 Oct 19
Externally publishedYes

ASJC Scopus subject areas

  • Materials Science(all)
  • Mechanics of Materials
  • Mechanical Engineering

Fingerprint Dive into the research topics of 'Smart self-adjustment of surface micelles of an amphiphilic block copolymer to nanoscopic pattern boundaries'. Together they form a unique fingerprint.

  • Cite this

    Yoon, B., Huh, J., Ito, H., Frommer, J., Sohn, B. H., Kim, J. H., Thomas, E. L., Park, C., & Kim, H. C. (2007). Smart self-adjustment of surface micelles of an amphiphilic block copolymer to nanoscopic pattern boundaries. Advanced Materials, 19(20), 3342-3348. https://doi.org/10.1002/adma.200700146