Soft lithography of graphene sheets via surface energy modification

Hansun Kim; Min Wook Jung; Sung Myung; Daesung Jung; Sun Sook Lee; Ki Jeong Kong; Jongsun Lim; Jong Heun Lee; Chong Yun Park; Ki Seok An

doi:10.1039/c2tc00472k

Soft lithography of graphene sheets via surface energy modification

Hansun Kim, Min Wook Jung, Sung Myung, Daesung Jung, Sun Sook Lee, Ki Jeong Kong, Jongsun Lim, Jong Heun Lee, Chong Yun Park, Ki Seok An

Research output: Contribution to journal › Article › peer-review

16 Citations (Scopus)

Abstract

A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

Original language	English
Pages (from-to)	1076-1079
Number of pages	4
Journal	Journal of Materials Chemistry C
Volume	1
Issue number	6
DOIs	https://doi.org/10.1039/c2tc00472k
Publication status	Published - 2013 Feb 14

ASJC Scopus subject areas

Chemistry(all)
Materials Chemistry

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10.1039/c2tc00472k

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title = "Soft lithography of graphene sheets via surface energy modification",

abstract = "A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.",

author = "Hansun Kim and Jung, {Min Wook} and Sung Myung and Daesung Jung and Lee, {Sun Sook} and Kong, {Ki Jeong} and Jongsun Lim and Lee, {Jong Heun} and Park, {Chong Yun} and An, {Ki Seok}",

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T1 - Soft lithography of graphene sheets via surface energy modification

AU - Kim, Hansun

AU - Jung, Min Wook

AU - Myung, Sung

AU - Jung, Daesung

AU - Lee, Sun Sook

AU - Kong, Ki Jeong

AU - Lim, Jongsun

AU - Lee, Jong Heun

AU - Park, Chong Yun

AU - An, Ki Seok

PY - 2013/2/14

Y1 - 2013/2/14

N2 - A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

AB - A simple and efficient soft lithographic process for an easily applicable patterning method for large-scale graphene sheets was demonstrated. The surface of an elastomeric stamp was functionalized with polar molecules to enhance the interfacial adhesive force between the stamp and the graphene layer. A specific graphene area was then patterned on the initial substrate and transferred to the target surface by contacting with the stamp.

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U2 - 10.1039/c2tc00472k

DO - 10.1039/c2tc00472k

M3 - Article

AN - SCOPUS:84876937941

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JO - Journal of Materials Chemistry C

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ER -

Soft lithography of graphene sheets via surface energy modification

Abstract

ASJC Scopus subject areas

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