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Specific contact resistivity reduction through Ar plasma-treated TiO2-x interfacial layer to metal/Ge contact
Gwang Sik Kim, Jeong Kyu Kim, Seung Hwan Kim, Jaesung Jo, Changhwan Shin, Jin Hong Park, Krishna C. Saraswat, Hyun Yong Yu
Research output: Contribution to journal › Article › peer-review
32
Citations
(Scopus)