Specific contact resistivity reduction through Ar plasma-treated TiO2-x interfacial layer to metal/Ge contact

Gwang Sik Kim, Jeong Kyu Kim, Seung Hwan Kim, Jaesung Jo, Changhwan Shin, Jin Hong Park, Krishna C. Saraswat, Hyun Yong Yu

Research output: Contribution to journalArticlepeer-review

32 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds