Spectroscopic charge pumping investigation of the amphoteric nature of Si/ SiO2 interface states

J. T. Ryan; L. C. Yu; J. H. Han; J. J. Kopanski; K. P. Cheung; F. Zhang; C. Wang; J. P. Campbell; J. S. Suehle

doi:10.1063/1.3597298

Spectroscopic charge pumping investigation of the amphoteric nature of Si/ SiO₂ interface states

J. T. Ryan, L. C. Yu, J. H. Han, J. J. Kopanski, K. P. Cheung, F. Zhang, C. Wang, J. P. Campbell, J. S. Suehle

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16 Citations (Scopus)

Abstract

The amphoteric nature of Si/ SiO₂ interface states in submicron sized metal-oxide-silicon-field-effect-transistors is observed using an enhanced spectroscopic charge pumping method. The method's simplicity and high sensitivity makes it a powerful tool for interrogating the true nature of electrically measured interface states in samples which exhibit extremely low defect densities. The spectroscopic results obtained clearly illustrate a signature "double peak" density of states consistent with amphoteric P_b center data obtained from electron spin resonance measurements. Since the method is a hybrid of the commonly used charge pumping methodology, it should find widespread use in electronic device characterization.

Original language	English
Article number	233502
Journal	Applied Physics Letters
Volume	98
Issue number	23
DOIs	https://doi.org/10.1063/1.3597298
Publication status	Published - 2011 Jun 6

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ASJC Scopus subject areas

Physics and Astronomy (miscellaneous)

Cite this

Ryan, J. T., Yu, L. C., Han, J. H., Kopanski, J. J., Cheung, K. P., Zhang, F., Wang, C., Campbell, J. P., & Suehle, J. S. (2011). Spectroscopic charge pumping investigation of the amphoteric nature of Si/ SiO₂ interface states. Applied Physics Letters, 98(23), [233502]. https://doi.org/10.1063/1.3597298

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AU - Cheung, K. P.

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AU - Wang, C.

AU - Campbell, J. P.

AU - Suehle, J. S.

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10.1063/1.3597298