Abstract
Thin SiO2 films were heat treated in different gas mixtures to determine their stability in functioning as high-temperature hydrogen permselective membranes. The films were formed within the walls of porous Vycor tubes by SiH4 oxidation in an opposing reactants geometry. Film deposition was carried out at 450 °C in the presence and absence of water vapor. Immediately after formation, the films were highly selective to hydrogen permeation having a H2:N2 permeability ratio of about 3000:1. The films were subsequently heat treated at 450-700°C in dry N2, dry O2, N2-H2O, and O2-H2 mixtures. The permeation rates of H2 and N2 changed depending on the original conditions of film formation as well as on the heat treatment.
| Original language | English |
|---|---|
| Pages (from-to) | 68-74 |
| Number of pages | 7 |
| Journal | AIChE Symposium Series |
| Volume | 85 |
| Issue number | 268 |
| Publication status | Published - 1989 |
| Event | Membrane Reactor Technology - Washington, DC, USA Duration: 1988 Nov 27 → 1988 Dec 2 |
ASJC Scopus subject areas
- Chemistry(all)
- Chemical Engineering(all)