Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

T. H. Kim, J. Seo, J. Choi, B. Y. Choi, Y. J. Song, Y. Kuk, S. J. Kahng

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)


The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3̄37] and [3̄37̄] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.

Original languageEnglish
Pages (from-to)30-34
Number of pages5
JournalSurface Science
Issue number1-3
Publication statusPublished - 2005 Dec 5


  • Epitaxy
  • Nanostructures
  • Scanning tunneling microscopy
  • Surface structure

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Materials Chemistry


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