Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface

T. H. Kim, J. Seo, J. Choi, B. Y. Choi, Y. J. Song, Y. Kuk, Se-Jong Kahng

Research output: Contribution to journalArticle

1 Citation (Scopus)

Abstract

The growth behavior and atomic structure of the Ag wetting layer grown on the W(1 1 0) surface, was studied with scanning tunneling microscopy. Deposited Ag atoms preferentially adsorb at the step edges and reveal a step-flow growth behavior at room temperature. In the Ag wetting layer, a periodic bright ridge structure was observed along the [3̄37] and [3̄37̄] directions. The atomic registry of the ridge structure is proposed on the basis of atomically resolved images.

Original languageEnglish
Pages (from-to)30-34
Number of pages5
JournalSurface Science
Volume595
Issue number1-3
DOIs
Publication statusPublished - 2005 Dec 5

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relieving
wetting
Wetting
ridges
Scanning tunneling microscopy
atomic structure
scanning tunneling microscopy
Atoms
room temperature
atoms
Temperature
Direction compound

Keywords

  • Epitaxy
  • Nanostructures
  • Scanning tunneling microscopy
  • Surface structure

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface. / Kim, T. H.; Seo, J.; Choi, J.; Choi, B. Y.; Song, Y. J.; Kuk, Y.; Kahng, Se-Jong.

In: Surface Science, Vol. 595, No. 1-3, 05.12.2005, p. 30-34.

Research output: Contribution to journalArticle

Kim, T. H. ; Seo, J. ; Choi, J. ; Choi, B. Y. ; Song, Y. J. ; Kuk, Y. ; Kahng, Se-Jong. / Strain-relieving ridge structure in a wetting layer on the W(1 1 0) surface. In: Surface Science. 2005 ; Vol. 595, No. 1-3. pp. 30-34.
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AU - Kahng, Se-Jong

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