Strongly phase-segregating block copolymers with sub-20 nm features

Kristian Kempe, Kato L. Killops, Justin E. Poelma, Hyunjung Jung, Joona Bang, Richard Hoogenboom, Helen Tran, Craig J. Hawker, Ulrich S. Schubert, Luis M. Campos

Research output: Contribution to journalArticle

18 Citations (Scopus)

Abstract

The modular synthesis and lithographic potential of diblock copolymers based on polystyrene-block-poly(2-ethyl-2-oxazoline) (PS-b-PEtOx) are highlighted herein. Controlled radical and living cationic polymerization techniques were utilized to synthesize hydrophobic PS and hydrophilic PEtOx building block of varying molar mass. Subsequently, "click" chemistry was used to couple the blocks and obtain a family of PS-b-PEtOx polymers. The influence of molar mass, composition, and thin-film thickness on the microphase-segregated morphology and orientation were investigated with atomic force microscopy (AFM) and grazing incidence small-angle X-ray scattering (GISAXS). Dense hexagonal arrays of cylindrical nanodomains normal to the substrate, having a periodicity of less than 20 nm were obtained.

Original languageEnglish
Pages (from-to)677-682
Number of pages6
JournalACS Macro Letters
Volume2
Issue number8
DOIs
Publication statusPublished - 2013 Sep 2

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Molar mass
Polystyrenes
Block copolymers
Cationic polymerization
Living polymerization
X ray scattering
Film thickness
Atomic force microscopy
Polymers
Thin films
Substrates
Chemical analysis
poly(2-ethyl-2-oxazoline)

ASJC Scopus subject areas

  • Organic Chemistry
  • Materials Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry

Cite this

Kempe, K., Killops, K. L., Poelma, J. E., Jung, H., Bang, J., Hoogenboom, R., ... Campos, L. M. (2013). Strongly phase-segregating block copolymers with sub-20 nm features. ACS Macro Letters, 2(8), 677-682. https://doi.org/10.1021/mz400309d

Strongly phase-segregating block copolymers with sub-20 nm features. / Kempe, Kristian; Killops, Kato L.; Poelma, Justin E.; Jung, Hyunjung; Bang, Joona; Hoogenboom, Richard; Tran, Helen; Hawker, Craig J.; Schubert, Ulrich S.; Campos, Luis M.

In: ACS Macro Letters, Vol. 2, No. 8, 02.09.2013, p. 677-682.

Research output: Contribution to journalArticle

Kempe, K, Killops, KL, Poelma, JE, Jung, H, Bang, J, Hoogenboom, R, Tran, H, Hawker, CJ, Schubert, US & Campos, LM 2013, 'Strongly phase-segregating block copolymers with sub-20 nm features', ACS Macro Letters, vol. 2, no. 8, pp. 677-682. https://doi.org/10.1021/mz400309d
Kempe K, Killops KL, Poelma JE, Jung H, Bang J, Hoogenboom R et al. Strongly phase-segregating block copolymers with sub-20 nm features. ACS Macro Letters. 2013 Sep 2;2(8):677-682. https://doi.org/10.1021/mz400309d
Kempe, Kristian ; Killops, Kato L. ; Poelma, Justin E. ; Jung, Hyunjung ; Bang, Joona ; Hoogenboom, Richard ; Tran, Helen ; Hawker, Craig J. ; Schubert, Ulrich S. ; Campos, Luis M. / Strongly phase-segregating block copolymers with sub-20 nm features. In: ACS Macro Letters. 2013 ; Vol. 2, No. 8. pp. 677-682.
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