Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition

Kwang Ryeol Lee, Myoung Geun Kim, Sung Jin Cho, Kwang Yong Eun, Tae Yeon Seong

Research output: Contribution to journalArticle

82 Citations (Scopus)

Abstract

Mechanical properties and atomic bond structure of Si incorporated diamond-like carbon (Si-DLC) films were investigated. The films were deposited by 13.56 MHz r.f.- plasma-assisted chemical vapour deposition (r.f.-PACVD), using mixtures of benzene and diluted silane (SiH4/H2 10:90) as the reaction gases. Si concentration in the film was varied from 0 to 17 atomic (at.)% by increasing the diluted silane fraction from 0 to 95%. It was observed that the mechanical properties of the film changed significantly when the Si concentration was less than 5 at.%. In this concentration range, hardness, residual stress and elastic constants increased with increasing Si concentration. For higher concentrations of Si, the mechanical properties showed saturated behaviour. The changes of the mechanical properties are discussed in terms of the content of three-dimensional inter-links of the atomic bond network.

Original languageEnglish
Pages (from-to)263-267
Number of pages5
JournalThin Solid Films
Volume308-309
Issue number1-4
Publication statusPublished - 1997 Oct 31
Externally publishedYes

Fingerprint

Diamond like carbon films
Chemical vapor deposition
diamonds
vapor deposition
mechanical properties
Plasmas
Silanes
Mechanical properties
carbon
silanes
Elastic constants
Benzene
Residual stresses
Gases
Hardness
residual stress
hardness
elastic properties
benzene
gases

Keywords

  • Diamond-like carbon
  • Si incorporated films

ASJC Scopus subject areas

  • Surfaces, Coatings and Films
  • Condensed Matter Physics
  • Surfaces and Interfaces

Cite this

Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition. / Lee, Kwang Ryeol; Kim, Myoung Geun; Cho, Sung Jin; Eun, Kwang Yong; Seong, Tae Yeon.

In: Thin Solid Films, Vol. 308-309, No. 1-4, 31.10.1997, p. 263-267.

Research output: Contribution to journalArticle

Lee, Kwang Ryeol ; Kim, Myoung Geun ; Cho, Sung Jin ; Eun, Kwang Yong ; Seong, Tae Yeon. / Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition. In: Thin Solid Films. 1997 ; Vol. 308-309, No. 1-4. pp. 263-267.
@article{0869ad1742344b838d5cbdf6eb63c434,
title = "Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition",
abstract = "Mechanical properties and atomic bond structure of Si incorporated diamond-like carbon (Si-DLC) films were investigated. The films were deposited by 13.56 MHz r.f.- plasma-assisted chemical vapour deposition (r.f.-PACVD), using mixtures of benzene and diluted silane (SiH4/H2 10:90) as the reaction gases. Si concentration in the film was varied from 0 to 17 atomic (at.){\%} by increasing the diluted silane fraction from 0 to 95{\%}. It was observed that the mechanical properties of the film changed significantly when the Si concentration was less than 5 at.{\%}. In this concentration range, hardness, residual stress and elastic constants increased with increasing Si concentration. For higher concentrations of Si, the mechanical properties showed saturated behaviour. The changes of the mechanical properties are discussed in terms of the content of three-dimensional inter-links of the atomic bond network.",
keywords = "Diamond-like carbon, Si incorporated films",
author = "Lee, {Kwang Ryeol} and Kim, {Myoung Geun} and Cho, {Sung Jin} and Eun, {Kwang Yong} and Seong, {Tae Yeon}",
year = "1997",
month = "10",
day = "31",
language = "English",
volume = "308-309",
pages = "263--267",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "1-4",

}

TY - JOUR

T1 - Structural dependence of mechanical properties of Si incorporated diamond-like carbon films deposited by RF plasma-assisted chemical vapour deposition

AU - Lee, Kwang Ryeol

AU - Kim, Myoung Geun

AU - Cho, Sung Jin

AU - Eun, Kwang Yong

AU - Seong, Tae Yeon

PY - 1997/10/31

Y1 - 1997/10/31

N2 - Mechanical properties and atomic bond structure of Si incorporated diamond-like carbon (Si-DLC) films were investigated. The films were deposited by 13.56 MHz r.f.- plasma-assisted chemical vapour deposition (r.f.-PACVD), using mixtures of benzene and diluted silane (SiH4/H2 10:90) as the reaction gases. Si concentration in the film was varied from 0 to 17 atomic (at.)% by increasing the diluted silane fraction from 0 to 95%. It was observed that the mechanical properties of the film changed significantly when the Si concentration was less than 5 at.%. In this concentration range, hardness, residual stress and elastic constants increased with increasing Si concentration. For higher concentrations of Si, the mechanical properties showed saturated behaviour. The changes of the mechanical properties are discussed in terms of the content of three-dimensional inter-links of the atomic bond network.

AB - Mechanical properties and atomic bond structure of Si incorporated diamond-like carbon (Si-DLC) films were investigated. The films were deposited by 13.56 MHz r.f.- plasma-assisted chemical vapour deposition (r.f.-PACVD), using mixtures of benzene and diluted silane (SiH4/H2 10:90) as the reaction gases. Si concentration in the film was varied from 0 to 17 atomic (at.)% by increasing the diluted silane fraction from 0 to 95%. It was observed that the mechanical properties of the film changed significantly when the Si concentration was less than 5 at.%. In this concentration range, hardness, residual stress and elastic constants increased with increasing Si concentration. For higher concentrations of Si, the mechanical properties showed saturated behaviour. The changes of the mechanical properties are discussed in terms of the content of three-dimensional inter-links of the atomic bond network.

KW - Diamond-like carbon

KW - Si incorporated films

UR - http://www.scopus.com/inward/record.url?scp=0031245446&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0031245446&partnerID=8YFLogxK

M3 - Article

AN - SCOPUS:0031245446

VL - 308-309

SP - 263

EP - 267

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 1-4

ER -