Structural study of amorphous vanadium oxide films for thin film microbattery

Han Ki Kim, Tae Yeon Seong, Young Soo Yoon

Research output: Contribution to journalArticle

20 Citations (Scopus)

Abstract

The fabrication of solid-state thin film batteries (TFB) consisting of amorphous V2O5/Pt/Ti/Si by using dual target magnetron radio frequency (rf) and direct current sputtering (dc) sputtering systems at room temperature was discussed. The structural properties of as-deposited and cycled LiPON and a-V2O5 films were characterized by transmission electron microscopy (TEM) and x-ray diffraction (XRD) measurements to investigate the degradation mechanism. It was showed that the gradual degradation of the discharge capacity of TFB was degraded with increasing cycle number.

Original languageEnglish
Pages (from-to)754-759
Number of pages6
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume21
Issue number2
Publication statusPublished - 2003 Mar 1
Externally publishedYes

Fingerprint

vanadium oxides
Vanadium
Oxide films
Sputtering
electric batteries
oxide films
sputtering
degradation
Degradation
Thin films
thin films
Structural properties
radio frequencies
x ray diffraction
Diffraction
direct current
Transmission electron microscopy
solid state
Fabrication
X rays

ASJC Scopus subject areas

  • Electrical and Electronic Engineering
  • Physics and Astronomy (miscellaneous)
  • Surfaces and Interfaces

Cite this

Structural study of amorphous vanadium oxide films for thin film microbattery. / Kim, Han Ki; Seong, Tae Yeon; Yoon, Young Soo.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 21, No. 2, 01.03.2003, p. 754-759.

Research output: Contribution to journalArticle

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