Structure and dielectric properties of BaTi₄O₉ thin films for RF-MIM capacitor applications

Engineering & Materials Science

• Dielectric properties 85%
• Thin films 66%
• Capacitance 60%
• Capacitors 55%
• Leakage currents 50%
• Current density 45%
• Magnetron sputtering 31%
• Film thickness 25%
• Electric properties 24%
• Crystalline materials 24%
• Permittivity 23%
• Substrates 16%
• Electric potential 12%
• Temperature 9%

Physics & Astronomy

• MIM (semiconductors) 100%
• capacitors 61%
• dielectric properties 58%
• capacitance 56%
• leakage 38%
• thin films 36%
• current density 33%
• magnetron sputtering 19%
• dissipation 18%
• frequency ranges 17%
• electrical properties 17%
• permittivity 16%
• coefficients 12%
• electric potential 12%
• temperature 6%

Chemical Compounds

• Capacitor 72%
• Dielectric Property 70%
• Leakage Current 46%
• Liquid Film 33%
• Current Density 25%
• Application 22%
• Magnetron Sputtering 20%
• Dissipation 19%
• Dielectric Constant 16%
• Electrical Property 14%
• Voltage 12%