Structured BiVO4Photoanode Fabricated via Sputtering for Large Areas and Enhanced Photoelectrochemical Performance

Sucheol Ju, Junho Jun, Soomin Son, Jaemin Park, Hangyu Lim, Wonjoong Kim, Dongwoo Chae, Heon Lee

Research output: Contribution to journalArticlepeer-review

1 Citation (Scopus)

Abstract

Bismuth vanadate (BiVO4) is a promising photoanode material; however, its efficiency significantly changes depending on the atomic ratio of Bi/V, and there is no suitable method for synthesizing large-area photoanodes. In this study, an efficient BiVO4 photoanode was fabricated via sputtering, by manipulating the molar ratio of Bi/V with V solution annealing. V solution annealing not only adjusted the atomic ratio of Bi/V but also increased the number of O vacancies, thereby improving the charge-separation and charge-transport efficiencies. Consequently, the photocurrent density of the sputtered photoanode with V solution annealing (BVO-V) was 1.86 mA/cm2, which is 23 times higher than that of the sputtered photoanode annealed under air conditions (BVO-A, 81.0 μA/cm2). Furthermore, microcone-patterned fluorine-doped SnO2 was fabricated to increase the active area and reduce the high reflectance, owing to the dense deposition because of the sputtering. Thus, the photocurrent density of the MC-BVO was 3.11 mA/cm2, which is approximately 67% higher than that of BVO-V (1.86 mA/cm2).

Original languageEnglish
Pages (from-to)17923-17932
Number of pages10
JournalACS Sustainable Chemistry and Engineering
Volume8
Issue number49
DOIs
Publication statusPublished - 2020 Dec 14

Keywords

  • BiVOsputtering
  • direct printing
  • patterned FTO
  • PEC water splitting
  • V solution annealing

ASJC Scopus subject areas

  • Chemistry(all)
  • Environmental Chemistry
  • Chemical Engineering(all)
  • Renewable Energy, Sustainability and the Environment

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