Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography

Sung Hoon Hong, Jae Yeon Hwang, Heon Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work, using hot embossing lithography, 8-inch sized sub-50nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50nm pattern was successfully fabricated on Si substrate.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages286-287
Number of pages2
DOIs
Publication statusPublished - 2007 Dec 1
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
Duration: 2007 Nov 52007 Nov 8

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
CountryJapan
CityKyoto
Period07/11/507/11/8

Fingerprint

Nanoimprint lithography
Fabrication
Polymers
Substrates
Lithography

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

Cite this

Hong, S. H., Hwang, J. Y., & Lee, H. (2007). Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 286-287). [4456216] https://doi.org/10.1109/IMNC.2007.4456216

Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. / Hong, Sung Hoon; Hwang, Jae Yeon; Lee, Heon.

Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 286-287 4456216.

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Hong, SH, Hwang, JY & Lee, H 2007, Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. in Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC., 4456216, pp. 286-287, s20th International Microprocesses and Nanotechnology Conference, MNC 2007, Kyoto, Japan, 07/11/5. https://doi.org/10.1109/IMNC.2007.4456216
Hong SH, Hwang JY, Lee H. Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. p. 286-287. 4456216 https://doi.org/10.1109/IMNC.2007.4456216
Hong, Sung Hoon ; Hwang, Jae Yeon ; Lee, Heon. / Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC. 2007. pp. 286-287
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