Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography

Sung Hoon Hong, Jae Yeon Hwang, Heon Lee

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

In this work, using hot embossing lithography, 8-inch sized sub-50nm featured flexible polymer template was clearly fabricated. UV-NIL process was taken on Si substrate with the polymer stamp and sub-50nm pattern was successfully fabricated on Si substrate.

Original languageEnglish
Title of host publicationDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC
Pages286-287
Number of pages2
DOIs
Publication statusPublished - 2007
Events20th International Microprocesses and Nanotechnology Conference, MNC 2007 - Kyoto, Japan
Duration: 2007 Nov 52007 Nov 8

Publication series

NameDigest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC

Other

Others20th International Microprocesses and Nanotechnology Conference, MNC 2007
CountryJapan
CityKyoto
Period07/11/507/11/8

ASJC Scopus subject areas

  • Hardware and Architecture
  • Electrical and Electronic Engineering

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  • Cite this

    Hong, S. H., Hwang, J. Y., & Lee, H. (2007). Sub-50nm featured polymer stamp fabrication for UV nanoimprint lithography. In Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC (pp. 286-287). [4456216] (Digest of Papers - Microprocesses and Nanotechnology 2007; 20th International Microprocesses and Nanotechnology Conference, MNC). https://doi.org/10.1109/IMNC.2007.4456216