Substrate temperature effect on the formation of PtRhOx thin films

Kwangbae Lee, Kyung Haeng Lee, Byung Kwon Ju, Chung Nam Whang

Research output: Contribution to journalArticle

2 Citations (Scopus)

Abstract

Conductive PtRhOx thin films were deposited at various substrate temperatures on bare Si wafers by means of the reactive sputtering method, using a Pt9Rh alloy target. (111)-axis oriented PtRhOx thin films were obtained for a substrate temperature around 400 °C. From the X-ray photoelectron spectroscopy studies, the atomic ratio of oxygen to platinum, O/Pt, in PtRhOx was found to decrease from 2.3 to 1.5 with increasing substrate temperature from 50 °C to 550 °C whereas the atomic ratio of Rh to Pt, Rh/Pt, remained constant at about 0.12. These results were attributed to a decrease of in the number of PtO2 binding states, accompanied by an increase in the number of PrO binding states, with the number of Rh2O3 binding states remaining constant. The resistivity of PtRhOx thin films deposited on Si wafers decreased to about 8.9×10-5 Ωcm with increasing substrate temperature up to 650 °C.

Original languageEnglish
Pages (from-to)745-748
Number of pages4
JournalJournal of the Korean Physical Society
Volume41
Issue number5
Publication statusPublished - 2002 Nov
Externally publishedYes

Keywords

  • Electrode barrier
  • Ferroelectric film
  • PtRhO
  • Substrate temperature

ASJC Scopus subject areas

  • Physics and Astronomy(all)

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