Surface Assembly Strategy for the Fabrication of MoS₂ Thin-Film Patterns

Molybdenum disulfide (MoS₂) is a novel material with remarkable properties that is widely investigated for future applications in electronics, sensors, and smart materials. In this respect, a low cost, easy process, large-area mass production process is needed to obtain diverse structures and surface patterns of MoS₂. Here, we demonstrate an effective MoS₂ patterning process using substrate surface modification that can solve the difficulties encountered in previous studies. This technique utilizes the sulfur vacancies introduced during chemical exfoliation of MoS₂ flakes. The MoS₂ patterning is performed via surface modification with thiol molecules on the substrate in pre-designed shapes. The thiol (–SH) group required to bond MoS₂ to the surface-modified substrate using (3-mercaptopropyl)trimethoxysilane was confirmed by FT-IR and the patterned MoS₂ was confirmed by Raman shift. Through this process, a gas sensor was fabricated and its feasibility was confirmed to show its applicability to various applications MoS₂.