TY - JOUR
T1 - Surface Assembly Strategy for the Fabrication of MoS2 Thin-Film Patterns
AU - Park, Gyuyeol
AU - Kim, Hyun Soo
AU - Lee, Byung Yang
N1 - Funding Information:
This project was supported by the National Research Foundation (NRF) (2016M3A7B4909581, 2018R1A2B2006640) and the Global Frontier Project from the Center for Intergrated Smart Sensors(CISS-2011-0031866), funded by the Ministry of Science and ICT.
Funding Information:
This project was supported by the National Research Foundation (NRF) (2016M3A7B4909581, 2018R1A2B2006640) and the Global Frontier Project from the Center for Intergrated Smart Sensors(CISS-2011-0031866), funded by the Ministry of Science and ICT.
Publisher Copyright:
© 2019, Korean Society for Precision Engineering.
PY - 2019/12/1
Y1 - 2019/12/1
N2 - Molybdenum disulfide (MoS2) is a novel material with remarkable properties that is widely investigated for future applications in electronics, sensors, and smart materials. In this respect, a low cost, easy process, large-area mass production process is needed to obtain diverse structures and surface patterns of MoS2. Here, we demonstrate an effective MoS2 patterning process using substrate surface modification that can solve the difficulties encountered in previous studies. This technique utilizes the sulfur vacancies introduced during chemical exfoliation of MoS2 flakes. The MoS2 patterning is performed via surface modification with thiol molecules on the substrate in pre-designed shapes. The thiol (–SH) group required to bond MoS2 to the surface-modified substrate using (3-mercaptopropyl)trimethoxysilane was confirmed by FT-IR and the patterned MoS2 was confirmed by Raman shift. Through this process, a gas sensor was fabricated and its feasibility was confirmed to show its applicability to various applications MoS2.
AB - Molybdenum disulfide (MoS2) is a novel material with remarkable properties that is widely investigated for future applications in electronics, sensors, and smart materials. In this respect, a low cost, easy process, large-area mass production process is needed to obtain diverse structures and surface patterns of MoS2. Here, we demonstrate an effective MoS2 patterning process using substrate surface modification that can solve the difficulties encountered in previous studies. This technique utilizes the sulfur vacancies introduced during chemical exfoliation of MoS2 flakes. The MoS2 patterning is performed via surface modification with thiol molecules on the substrate in pre-designed shapes. The thiol (–SH) group required to bond MoS2 to the surface-modified substrate using (3-mercaptopropyl)trimethoxysilane was confirmed by FT-IR and the patterned MoS2 was confirmed by Raman shift. Through this process, a gas sensor was fabricated and its feasibility was confirmed to show its applicability to various applications MoS2.
KW - Molybdenum disulfide
KW - Sulfur defect
KW - Surface modification
KW - Thin-film patterning
UR - http://www.scopus.com/inward/record.url?scp=85073953383&partnerID=8YFLogxK
U2 - 10.1007/s12541-019-00207-9
DO - 10.1007/s12541-019-00207-9
M3 - Article
AN - SCOPUS:85073953383
VL - 20
SP - 2215
EP - 2220
JO - International Journal of Precision Engineering and Manufacturing
JF - International Journal of Precision Engineering and Manufacturing
SN - 1229-8557
IS - 12
ER -