Synthesis and characterization of fluoro-co-Phenyl silsesquioxane (FCPSQ) for low dielectric constant materials

Seung Sock Choi, He Seung Lee, Eun Kyeong Kim, Kyung Youl Baek, Dong Hoon Choi, Seung Sang Hwang

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A new type of low-k dielectric material, poly(tridecafluoro1,1,2,2, tetrahydrooctyl-co-phenylsilsesquioxane) (PFCPSQ) was synthesized by hydrolysis and condensation reaction of trimethoxysilyl monomers in the presence of a base catalyst in H2O/THF mixture solvent at 25°C. Chemical compositions, molecular weight, and structure of the obtained PFCPSQs were characterized using 1H NMR, 29Si NMR, FT-IR, and GPC. Dielectric values were examined by a HP-4190 system and a dielectric constant k of 1.92 was obtained.

Original languageEnglish
Pages (from-to)231-238
Number of pages8
JournalMolecular Crystals and Liquid Crystals
Publication statusPublished - 2010 Jan 1



  • Dielectric material
  • Fluorine polymer
  • Silsesquioxane

ASJC Scopus subject areas

  • Chemistry(all)
  • Condensed Matter Physics
  • Materials Science(all)

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