Synthesis and characterization of hyperbranched polymers with increased chemical versatility for imprint lithographic resists

Anzar Khan, Michael Malkoch, Martha F. Montague, Craig J. Hawker

Research output: Contribution to journalArticle

32 Citations (Scopus)

Abstract

Hyperbranched polymers were prepared from a variety of mono- and difunctional monomers and used in the development of novel UV-imprint lithography (UV-IL) resists. The unique physical and chemical properties of these hyperbranched materials significantly increase the range of molecular systems that could be imprinted. Traditional challenges, such as the use of monomers that have low boiling points or the use of insoluble/highly crystalline momomers, are overcome by the preparation of hyperbranched polymers that incorporate these repeat units. In addition, the low viscosity of the hyperbranched macromolecules and the large number of reactive chain ends overcome many difficulties that are traditionally associated with the use of polymeric materials as imprint resists. Hyperbranched polymers containing up to 12 mol % pendant vinyl groups, needed for secondary crosslinking during imprinting, were prepared with a wide range of repeat unit structures and successfully imprinted with features from tens of microns to ∼ 100 nm.

Original languageEnglish
Pages (from-to)6238-6254
Number of pages17
JournalJournal of Polymer Science, Part A: Polymer Chemistry
Volume46
Issue number18
DOIs
Publication statusPublished - 2008 Sep 15

Keywords

  • Hyperbranched
  • Imprint lithography
  • Living radical polymerization
  • Photopolymerization
  • Resists

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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