Synthesis of novel platinum precursor and its application to metal organic chemical vapor deposition of platinum thin films

Sook Lee Sun, Ho Min Lee, Min Jung Park, Ki Seok An, Jinkwon Kim, Jong Heun Lee, Taek Mo Chung, Gyoun Kim Chang

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5 Citations (Scopus)

Abstract

A novel platinum aminoalkoxide complex, Pt(dmamp)2 has been prepared by the reaction of cis-(py)2PtI2 with two equivalents of Na(dmamp) (dmamp = 1-dimethylamino-2-methyl-2-propanolate). Single-crystal X-ray crystallographic analysis shows that the Pt(dmamp)2 complex keeps a square planar geometry with each two nitrogen atoms and two oxygen atoms having trans configuration. Platinum films have been deposited on TaN/ Ta/Si substrates by metal organic chemical vapor deposition (MOCVD) using Pt(dmamp)2. As-deposited platinum thin films did not contain any appreciable amounts of impurities except a little carbon. As the deposition temperature was increased, the films resistivity and deposition rate increased. The electrical resistivity (13.6 μ Ωcm) of Pt film deposited at 400 °C is a little higher than the bulk value (10.5 μ Ωcm) at 293 K. The chemical composition, crystalline structure, and morphology of the deposited films were investigated by X-ray photoelectron spectroscopy, X-ray diffraction, and atomic force microscopy.

Original languageEnglish
Pages (from-to)1491-1494
Number of pages4
JournalBulletin of the Korean Chemical Society
Volume29
Issue number8
Publication statusPublished - 2008 Aug 20

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Keywords

  • Aminoalkoxide
  • MOCVD
  • Platinum
  • Precursor
  • Thin films

ASJC Scopus subject areas

  • Chemistry(all)

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