Synthesis of silicon-containing materials for UV-curable imprint etch barrier solutions

Sun Sik Song, Sang Mook Kim, Byung Yeon Choi, Gun Young Jung, Heon Lee

Research output: Contribution to journalArticle

4 Citations (Scopus)

Abstract

Silicon-containing acrylate and vinyl-ether derivatives, i.e., bis-(acryloxyethyloxy)-dimethylsilane, bis-(acryloxyethyloxy)-bis- (trimethylsilylmethyl)-silane, and bis-(vinyloxyethyloxy)- dimethylsilane, were synthesized. These materials, together with Irgacure 184 as a radical photoinitiator, were used as components for UV-curable imprint etch barrier (IEB) solutions. The effects of each material on the imprint properties of the IEB solution, such as viscosity and dry-etching resistance, were evaluated. The etch resistance of cured IEB films against oxygen plasma increased with the amount of silicon in the synthesized material. The vinyl-ether derivative had a much lower viscosity than the acrylate derivative. Formulations based on the three synthesized materials were made to find the optimum composition among them in terms of the required properties for the nanoimprinting and the following processes. The optimized formulation was applied to the nanoimprinting and subsequent lift-off process to define nanoscale features of eight chrome (Cr) metal lines with 65 nm linewidth at 250 nm pitch.

Original languageEnglish
Pages (from-to)1984-1988
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Volume27
Issue number4
DOIs
Publication statusPublished - 2009 Aug 14

Fingerprint

acrylates
Silicon
ethers
silicon
synthesis
Derivatives
viscosity
formulations
Ethers
oxygen plasma
Viscosity
silanes
Dry etching
chromium
Silanes
etching
Linewidth
Plasmas
metals
Oxygen

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering

Cite this

Synthesis of silicon-containing materials for UV-curable imprint etch barrier solutions. / Song, Sun Sik; Kim, Sang Mook; Choi, Byung Yeon; Jung, Gun Young; Lee, Heon.

In: Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, Vol. 27, No. 4, 14.08.2009, p. 1984-1988.

Research output: Contribution to journalArticle

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