Ta2O5-y-based ReRAM device with annealing-free Ag:ZrNx-based bilayer selector device

Donghyun Kim, Ju Hyun Park, Dong Su Jeon, Tukaram D. Dongale, Tae Geun Kim

Research output: Contribution to journalArticlepeer-review

6 Citations (Scopus)

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Engineering & Materials Science

Chemical Compounds