The effect of substrate heating on the tunability of rf-sputtered Bi 2O3-ZnO-Nb2O5 thin films

S. Ha, Y. S. Lee, Y. P. Hong, H. Y. Lee, Y. C. Lee, K. H. Ko, Dong-Wan Kim, H. B. Hong, K. S. Hong

Research output: Contribution to journalArticle

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Abstract

Reactively rf-sputtered Bi2O3-ZnO-Nb 2O5 (BZN) thin films were prepared on Pt(111)/TiO 2/SiO2/Si with substrate heating. The effects of substrate heating on the structures, morphologies, dielectric properties, and voltage-tunable dielectric properties of the films were investigated. With heating, the BZN thin films could be deposited in crystalline form as the cubic pyrochlore phase. The amounts of secondary phases, such as zinc niobate and bismuth niobate, depended on the substrate temperature. The more compounding of the BZN crystalline phase proceeded at deposition, the less formation of secondary phases and stoichiometric change occurred after post-annealing. Therefore, improvement of the dielectric constant and tunability of thin films by grain-size enlargement might be possible with proper substrate heating and post-annealing. The BZN thin films sputtered with a substrate temperature of 550°C and annealed at 800°C showed a maximum tunability of 26.5% at a dc bias field of 1000 kV/cm and measurement frequency of 1 MHz.

Original languageEnglish
Pages (from-to)585-590
Number of pages6
JournalApplied Physics A: Materials Science and Processing
Volume80
Issue number3
DOIs
Publication statusPublished - 2005 Feb 1
Externally publishedYes

Fingerprint

Heating
Thin films
heating
Substrates
thin films
niobates
Dielectric properties
dielectric properties
Annealing
Crystalline materials
compounding
Bismuth
annealing
frequency measurement
bismuth
Zinc
Permittivity
zinc
grain size
permittivity

ASJC Scopus subject areas

  • Materials Science(all)
  • Physics and Astronomy (miscellaneous)

Cite this

The effect of substrate heating on the tunability of rf-sputtered Bi 2O3-ZnO-Nb2O5 thin films. / Ha, S.; Lee, Y. S.; Hong, Y. P.; Lee, H. Y.; Lee, Y. C.; Ko, K. H.; Kim, Dong-Wan; Hong, H. B.; Hong, K. S.

In: Applied Physics A: Materials Science and Processing, Vol. 80, No. 3, 01.02.2005, p. 585-590.

Research output: Contribution to journalArticle

Ha, S. ; Lee, Y. S. ; Hong, Y. P. ; Lee, H. Y. ; Lee, Y. C. ; Ko, K. H. ; Kim, Dong-Wan ; Hong, H. B. ; Hong, K. S. / The effect of substrate heating on the tunability of rf-sputtered Bi 2O3-ZnO-Nb2O5 thin films. In: Applied Physics A: Materials Science and Processing. 2005 ; Vol. 80, No. 3. pp. 585-590.
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