TY - JOUR
T1 - The effects of film thickness on the electrical, optical, and structural properties of cylindrical, rotating, magnetron-sputtered ITO films
AU - Kim, Jae Ho
AU - Seong, Tae Yeon
AU - Ahn, Kyung Jun
AU - Chung, Kwun Bum
AU - Seok, Hae Jun
AU - Seo, Hyeong Jin
AU - Kim, Han Ki
N1 - Funding Information:
This work was supported by the Korea Institute of Energy Technology Evaluation and Planning (KETEP) and the Ministry of Trade, Industry & Energy (MOTIE) of the Republic of Korea (No. 20163010012200) and received partial support from the Technology Innovation Program (or Industrial Strategic Technology Development Program (10079601) funded By the Ministry of Trade, Industry & Energy (MOTIE, Korea).
Publisher Copyright:
© 2018 Elsevier B.V.
PY - 2018/5/15
Y1 - 2018/5/15
N2 - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.
AB - We report the characteristics of Sn-doped In 2 O 3 (ITO) films intended for use as transparent conducting electrodes; the films were prepared via a five-generation, in-line type, cylindrical, rotating magnetron sputtering (CRMS) system as a function of film thickness. By using a rotating cylindrical ITO target with high usage (∼80%), we prepared high conductivity, transparent ITO films on five-generation size glass. The effects of film thickness on the electrical, optical, morphological, and structural properties of CRMS-grown ITO films are investigated in detail to correlate the thickness and performance of ITO films. The preferred orientation changed from the (2 2 2) to the (4 0 0) plane with increasing thickness of ITO is attributed to the stability of the (4 0 0) plane against resputtering during the CRMS process. Based on X-ray diffraction, surface field emission scanning electron microscopy, and cross-sectional transmission electron microscopy, we suggest a possible mechanism to explain the preferred orientation and effects of film thickness on the performance of CRMS-grown ITO films.
KW - Cylindrical rotating magnetron sputtering
KW - Preferred orientation
KW - Sn-doped In O
KW - Thickness
KW - Transparent conducting electrodes
UR - http://www.scopus.com/inward/record.url?scp=85041410163&partnerID=8YFLogxK
U2 - 10.1016/j.apsusc.2018.01.318
DO - 10.1016/j.apsusc.2018.01.318
M3 - Article
AN - SCOPUS:85041410163
VL - 440
SP - 1211
EP - 1218
JO - Applied Surface Science
JF - Applied Surface Science
SN - 0169-4332
ER -