The oxide/nitride interface: A study for gate dielectrics and field passivation

B. P. Gila, B. Luo, J. Kim, R. Mehandru, J. R. LaRoche, A. H. Onstine, E. Lambers, K. Siebein, C. R. Abernathy, F. Ren, S. J. Pearton

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