The role of cleaning conditions and epitaxial layer structure on reliability of Sc2O3 and MgO passivation on AlGaN/GaN HEMTS

B. Luo, R. M. Mehandru, Jihyun Kim, F. Ren, B. P. Gila, A. H. Onstine, C. R. Abernathy, S. J. Pearton, R. C. Fitch, J. Gillespie, R. Dellmer, T. Jenkins, J. Sewell, D. Via, A. Crespo

Research output: Contribution to journalArticlepeer-review

16 Citations (Scopus)

Abstract

The effect of layer structure (GaN versus AlGaN cap) and cleaning procedure prior to Sc2O3 or MgO deposition at 100 °C were examined for their effects on the long-term bias-stress stability of AlGaN/GaN high electron mobility transistors (HEMTs). Surface cleaning by itself was not sufficient to prevent current collapse in the devices. The forward and reverse gate leakage currents were decreased under most conditions upon deposition of the oxide passivation layers. After ≈13 h of bias-stressing, the MgO-passivated HEMTs retain ≥90% their initial drain-source current. The Sc2O3-passivated devices retained ≈80% recovery of the current under the same conditions.

Original languageEnglish
Pages (from-to)2185-2190
Number of pages6
JournalSolid-State Electronics
Volume46
Issue number12
DOIs
Publication statusPublished - 2002 Dec
Externally publishedYes

Keywords

  • Bias-Stressing test
  • Current dispersion
  • GaN HEMT
  • Gate lag measurement
  • Oxide passivation film

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Electrical and Electronic Engineering
  • Materials Chemistry

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