Thin composite film passivation through RF sputtering method for Large-sized organic Display Devices

Joo Won Lee; Young Min Kim; Jung Soo Park; Sung Jin Bea; Na Rae Kim; Jai Kyeong Kim; Jin-Jang; Byeong Kwon Ju

Thin composite film passivation through RF sputtering method for Large-sized organic Display Devices

Joo Won Lee, Young Min Kim, Jung Soo Park, Sung Jin Bea, Na Rae Kim, Jai Kyeong Kim, Jin-Jang, Byeong Kwon Ju

School of Electrical Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

Transparent thin composite films (TCFs) were deposited on OLED devices by means of RF sputtering method and their passivation-properties were evaluated by comparing to the e-beam evaporating method. This composite film formed by mixed ratio of MgO (3wt %): SiO₂ (1wt %) was developed from pallet as a source of e-beam evaporator to 6-inch size target for sputtering in order to apply for large-sized organic display devices. Water Vapor Transmission Rates (WVTR) of the deposited films were measured as a function of thickness to assess the effectiveness of this film as a passivation layer and it applied to real devices. From this study, we can confirm that the passivation layer formed by TCFs using RF sputtering method sufficiently shows the potentiality of application to passivation layer for organic display devices.

Original language	English
Pages (from-to)	1480-1483
Number of pages	4
Journal	Proceedings of International Meeting on Information Display
Volume	2
Publication status	Published - 2006
Event	5th International Meeting on Information Display - Seoul, Korea, Republic of Duration: 2005 Jul 19 → 2005 Jul 23

ASJC Scopus subject areas

Engineering(all)

Cite this

Thin composite film passivation through RF sputtering method for Large-sized organic Display Devices. / Lee, Joo Won; Kim, Young Min; Park, Jung Soo; Bea, Sung Jin; Kim, Na Rae; Kim, Jai Kyeong; Jin-Jang, ; Ju, Byeong Kwon.

In: Proceedings of International Meeting on Information Display, Vol. 2, 2006, p. 1480-1483.

Research output: Contribution to journal › Conference article › peer-review

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abstract = "Transparent thin composite films (TCFs) were deposited on OLED devices by means of RF sputtering method and their passivation-properties were evaluated by comparing to the e-beam evaporating method. This composite film formed by mixed ratio of MgO (3wt %): SiO2 (1wt %) was developed from pallet as a source of e-beam evaporator to 6-inch size target for sputtering in order to apply for large-sized organic display devices. Water Vapor Transmission Rates (WVTR) of the deposited films were measured as a function of thickness to assess the effectiveness of this film as a passivation layer and it applied to real devices. From this study, we can confirm that the passivation layer formed by TCFs using RF sputtering method sufficiently shows the potentiality of application to passivation layer for organic display devices.",

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AU - Lee, Joo Won

AU - Kim, Young Min

AU - Park, Jung Soo

AU - Bea, Sung Jin

AU - Kim, Na Rae

AU - Kim, Jai Kyeong

AU - Jin-Jang,

AU - Ju, Byeong Kwon

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N2 - Transparent thin composite films (TCFs) were deposited on OLED devices by means of RF sputtering method and their passivation-properties were evaluated by comparing to the e-beam evaporating method. This composite film formed by mixed ratio of MgO (3wt %): SiO2 (1wt %) was developed from pallet as a source of e-beam evaporator to 6-inch size target for sputtering in order to apply for large-sized organic display devices. Water Vapor Transmission Rates (WVTR) of the deposited films were measured as a function of thickness to assess the effectiveness of this film as a passivation layer and it applied to real devices. From this study, we can confirm that the passivation layer formed by TCFs using RF sputtering method sufficiently shows the potentiality of application to passivation layer for organic display devices.

AB - Transparent thin composite films (TCFs) were deposited on OLED devices by means of RF sputtering method and their passivation-properties were evaluated by comparing to the e-beam evaporating method. This composite film formed by mixed ratio of MgO (3wt %): SiO2 (1wt %) was developed from pallet as a source of e-beam evaporator to 6-inch size target for sputtering in order to apply for large-sized organic display devices. Water Vapor Transmission Rates (WVTR) of the deposited films were measured as a function of thickness to assess the effectiveness of this film as a passivation layer and it applied to real devices. From this study, we can confirm that the passivation layer formed by TCFs using RF sputtering method sufficiently shows the potentiality of application to passivation layer for organic display devices.

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Thin composite film passivation through RF sputtering method for Large-sized organic Display Devices

Abstract

ASJC Scopus subject areas

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