Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates

Geuntak Lee, Pil Sung Jo, Bokyung Yoon, Tae Hee Kim, Himadri Acharya, Hiroshi Ito, Ho Cheol Kim, June Huh, Cheolmin Park

Research output: Contribution to journalArticle

11 Citations (Scopus)

Abstract

We have investigated the formation of as-cast thin films of a poly(styrene-block-4-hydroxystyrene) (PS-b-PHOST) copolymer spin-coated directly on topographic prepattern substrates. Either wetting or dewetting of a polymer thin film, on the elevated regions occurs in the nonequilibrium state during spin-coating with solvent vapor saturated and strongly depends on the dimensions of the prepatterns. The ratio of periodic unit area to elevated one of a prepattern (β value) is found as one of the most important factors for wettability of a thin film. The dewetting of a thin film, guided by the edges of either elevated individual periodic lines or mesas, took place with self-assembled block copolymer nanostructure when the β value was greater than a critical value of ̃4 in our system.

Original languageEnglish
Pages (from-to)9290-9294
Number of pages5
JournalMacromolecules
Volume41
Issue number23
DOIs
Publication statusPublished - 2008 Dec 9
Externally publishedYes

ASJC Scopus subject areas

  • Organic Chemistry
  • Polymers and Plastics
  • Inorganic Chemistry
  • Materials Chemistry

Fingerprint Dive into the research topics of 'Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates'. Together they form a unique fingerprint.

  • Cite this

    Lee, G., Jo, P. S., Yoon, B., Kim, T. H., Acharya, H., Ito, H., Kim, H. C., Huh, J., & Park, C. (2008). Thin poly(styrene-block-4-hydroxystyrene) block copolymer films spin-coated directly on topographic prepattern substrates. Macromolecules, 41(23), 9290-9294. https://doi.org/10.1021/ma801631y