Tin-doped indium oxide (ITO) film deposition by ion beam sputtering

Younggun Han, Donghwan Kim, Jun Sik Cho, Seok Keun Koh, Yo Seung Song

Research output: Contribution to journalArticle

26 Citations (Scopus)


Indium tin oxide (ITO) thin films were deposited by ion beam sputtering. This paper aimed at the reach of high conductivity and high transmittance simultaneously at relatively low substrate temperature. In order to reach the objects, the influences of substrate temperature, ion beam energy, and oxygen gas flowing rate on the properties of deposited ITO films were investigated. Resistivity showed the lowest value of 1.5 × 10 -4 Ω cm on the films deposited by 1.3 keV Ar ions at 100°C. The microstructure of the films was sub-grain (domain) structure. The ITO films have above 80% of transmittance in the visible wavelength including that of the glass substrate.

Original languageEnglish
Pages (from-to)211-218
Number of pages8
JournalSolar Energy Materials and Solar Cells
Issue number1
Publication statusPublished - 2001 Jan 1

ASJC Scopus subject areas

  • Renewable Energy, Sustainability and the Environment
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films

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