Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films

Jiyoung Jeong, Jeong Sook Ha, Sang-Soo Lee, Jeong Gon Son

Research output: Contribution to journalArticle

12 Citations (Scopus)

Abstract

Highly ordered perpendicular orientation and straightly parallel orientation coexisting polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical microdomains with 10 nm width can be realized by using polyvinyl acetate as a partially dewetted topcoat and solvent annealing with acetone vapor. During solvent annealing, the swelled topcoat begins to dewet and the dewetting rim sweeps the surface of the block copolymer films to align the cylindrical microdomains with the direction of dewetting propagation. However, the wetted region of the topcoat/PS-b-PDMS film forms with a perpendicular orientation due to reduced surface tension and sufficient concentration gradient in the solvent evaporation step. The orientational changes (perpendicular/straightly parallel orientation) in the dewetted/wetted area are also investigated according to the vapor pressure of solvent annealing. The degree of directionality of the swept PS-b-PDMS films according to the distance from the dewetting front, which is equivalent with time after sweeping, is examined. To control the direction of dewetting and complex structures within a specific area, an imprinting process is introduced to form topographical line-space patterns in the topcoat and perpendicular/parallel orientation of BCP patterns in the line-space patterns, respectively.

Original languageEnglish
Pages (from-to)1261-1266
Number of pages6
JournalMacromolecular Rapid Communications
Volume36
Issue number13
DOIs
Publication statusPublished - 2015 Jul 1

Fingerprint

Block copolymers
Polystyrenes
Polydimethylsiloxane
Annealing
Polyvinyl acetates
Acetone
Vapor pressure
Surface tension
Evaporation
Vapors
baysilon
Direction compound

Keywords

  • block copolymer
  • dewetting
  • directional alignment
  • orientation
  • thin films

ASJC Scopus subject areas

  • Organic Chemistry
  • Materials Chemistry
  • Polymers and Plastics

Cite this

Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films. / Jeong, Jiyoung; Ha, Jeong Sook; Lee, Sang-Soo; Son, Jeong Gon.

In: Macromolecular Rapid Communications, Vol. 36, No. 13, 01.07.2015, p. 1261-1266.

Research output: Contribution to journalArticle

@article{48afc0abc01d46d5ab386aec545b274d,
title = "Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films",
abstract = "Highly ordered perpendicular orientation and straightly parallel orientation coexisting polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical microdomains with 10 nm width can be realized by using polyvinyl acetate as a partially dewetted topcoat and solvent annealing with acetone vapor. During solvent annealing, the swelled topcoat begins to dewet and the dewetting rim sweeps the surface of the block copolymer films to align the cylindrical microdomains with the direction of dewetting propagation. However, the wetted region of the topcoat/PS-b-PDMS film forms with a perpendicular orientation due to reduced surface tension and sufficient concentration gradient in the solvent evaporation step. The orientational changes (perpendicular/straightly parallel orientation) in the dewetted/wetted area are also investigated according to the vapor pressure of solvent annealing. The degree of directionality of the swept PS-b-PDMS films according to the distance from the dewetting front, which is equivalent with time after sweeping, is examined. To control the direction of dewetting and complex structures within a specific area, an imprinting process is introduced to form topographical line-space patterns in the topcoat and perpendicular/parallel orientation of BCP patterns in the line-space patterns, respectively.",
keywords = "block copolymer, dewetting, directional alignment, orientation, thin films",
author = "Jiyoung Jeong and Ha, {Jeong Sook} and Sang-Soo Lee and Son, {Jeong Gon}",
year = "2015",
month = "7",
day = "1",
doi = "10.1002/marc.201500088",
language = "English",
volume = "36",
pages = "1261--1266",
journal = "Macromolecular Rapid Communications",
issn = "1022-1336",
publisher = "Wiley-VCH Verlag",
number = "13",

}

TY - JOUR

T1 - Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films

AU - Jeong, Jiyoung

AU - Ha, Jeong Sook

AU - Lee, Sang-Soo

AU - Son, Jeong Gon

PY - 2015/7/1

Y1 - 2015/7/1

N2 - Highly ordered perpendicular orientation and straightly parallel orientation coexisting polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical microdomains with 10 nm width can be realized by using polyvinyl acetate as a partially dewetted topcoat and solvent annealing with acetone vapor. During solvent annealing, the swelled topcoat begins to dewet and the dewetting rim sweeps the surface of the block copolymer films to align the cylindrical microdomains with the direction of dewetting propagation. However, the wetted region of the topcoat/PS-b-PDMS film forms with a perpendicular orientation due to reduced surface tension and sufficient concentration gradient in the solvent evaporation step. The orientational changes (perpendicular/straightly parallel orientation) in the dewetted/wetted area are also investigated according to the vapor pressure of solvent annealing. The degree of directionality of the swept PS-b-PDMS films according to the distance from the dewetting front, which is equivalent with time after sweeping, is examined. To control the direction of dewetting and complex structures within a specific area, an imprinting process is introduced to form topographical line-space patterns in the topcoat and perpendicular/parallel orientation of BCP patterns in the line-space patterns, respectively.

AB - Highly ordered perpendicular orientation and straightly parallel orientation coexisting polystyrene-block-polydimethylsiloxane (PS-b-PDMS) cylindrical microdomains with 10 nm width can be realized by using polyvinyl acetate as a partially dewetted topcoat and solvent annealing with acetone vapor. During solvent annealing, the swelled topcoat begins to dewet and the dewetting rim sweeps the surface of the block copolymer films to align the cylindrical microdomains with the direction of dewetting propagation. However, the wetted region of the topcoat/PS-b-PDMS film forms with a perpendicular orientation due to reduced surface tension and sufficient concentration gradient in the solvent evaporation step. The orientational changes (perpendicular/straightly parallel orientation) in the dewetted/wetted area are also investigated according to the vapor pressure of solvent annealing. The degree of directionality of the swept PS-b-PDMS films according to the distance from the dewetting front, which is equivalent with time after sweeping, is examined. To control the direction of dewetting and complex structures within a specific area, an imprinting process is introduced to form topographical line-space patterns in the topcoat and perpendicular/parallel orientation of BCP patterns in the line-space patterns, respectively.

KW - block copolymer

KW - dewetting

KW - directional alignment

KW - orientation

KW - thin films

UR - http://www.scopus.com/inward/record.url?scp=84934442100&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84934442100&partnerID=8YFLogxK

U2 - 10.1002/marc.201500088

DO - 10.1002/marc.201500088

M3 - Article

VL - 36

SP - 1261

EP - 1266

JO - Macromolecular Rapid Communications

JF - Macromolecular Rapid Communications

SN - 1022-1336

IS - 13

ER -